For over 40 years, Noah Hershkowitz’s research has broadened the understanding of the fundamental properties of plasma. His work has covered a wide range of plasma phenomena including low-temperature plasmas, semiconductor fabricating plasmas, fusion plasmas, and space plasmas. His groundbreaking contributions to understanding solitons, sheaths, and presheaths have impacted semiconductor etching, as the plasma sheath plays a major role in the linear acceleration of ions that results in the small features of modern microelectronic circuits. His pioneering work on emissive probes resulted in the development of a new technique for determining plasma potential by analyzing emissive probe emitted current. In 2002 he was the first to measure plasma potential throughout the presheath and sheath at a boundary in a weakly collisional plasma. He has supervised 56 Ph.D.'s.
An IEEE Life Fellow, Dr. Hershkowitz is the Irving Languir Professor Emeritus at the University of Wisconsin, Madison, WI, USA.